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Original version
Jogschies, L.; Rittinger, J.; Klaas, D.; Wurz, M.C.: Stress Reduction in Sputtered Thin NiFe 81/19 Layers for Magnetic Field Sensors. In: Procedia Technology 26 (2016), S. 162-168. DOI: https://doi.org/10.1016/j.protcy.2016.08.022
Repository version
To cite the version in the repository, please use this identifier:
https://doi.org/10.15488/3249
Files in this item
| Abstract: | |
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Flexible magnetic field sensors using the anisotropic magnetoresistive effect that have been developed within the Collaborative Research Center 653 are to be transferred into industrial applications. Occurring challenges result from interactions between the flexible polyimide substrate and the functional layer namely a thin NiFe 81/19 film deposited by a DC sputter process. We have optimized the DC sputter process with regard to stress and roughness reduction.
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| License of this version: | CC BY-NC-ND 4.0 Unported - https://creativecommons.org/licenses/by-nc-nd/4.0/ |
| Publication type: | Article |
| Publishing status: | publishedVersion |
| Publication date: | 2016 |
| Keywords english: | Flexible Substrate, Collaborative Research Center 653, stress in metallic thin films |
| DDC: | 600 | Technik |
| Controlled keywords(GND): | Konferenzschrift |
This item appears in the following Collection(s):
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Fakultät für Maschinenbau
Frei zugängliche Publikationen aus der Fakultät für Maschinenbau