Stress Reduction in Sputtered Thin NiFe 81/19 Layers for Magnetic Field Sensors

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Jogschies, L.; Rittinger, J.; Klaas, D.; Wurz, M.C.: Stress Reduction in Sputtered Thin NiFe 81/19 Layers for Magnetic Field Sensors. In: Procedia Technology 26 (2016), S. 162-168. DOI: https://doi.org/10.1016/j.protcy.2016.08.022

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Sum total of downloads: 1,859




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Abstract: 
Flexible magnetic field sensors using the anisotropic magnetoresistive effect that have been developed within the Collaborative Research Center 653 are to be transferred into industrial applications. Occurring challenges result from interactions between the flexible polyimide substrate and the functional layer namely a thin NiFe 81/19 film deposited by a DC sputter process. We have optimized the DC sputter process with regard to stress and roughness reduction.
License of this version: CC BY-NC-ND 4.0 Unported
Document Type: article
Publishing status: publishedVersion
Issue Date: 2016
Appears in Collections:Fakultät für Maschinenbau

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pos. country downloads
total perc.
1 image of flag of Germany Germany 1,699 91.39%
2 image of flag of United States United States 59 3.17%
3 image of flag of Honduras Honduras 11 0.59%
4 image of flag of Europe Europe 8 0.43%
5 image of flag of China China 8 0.43%
6 image of flag of Russian Federation Russian Federation 7 0.38%
7 image of flag of United Kingdom United Kingdom 7 0.38%
8 image of flag of Netherlands Netherlands 6 0.32%
9 image of flag of Spain Spain 6 0.32%
10 image of flag of Austria Austria 6 0.32%
    other countries 42 2.26%

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