ITO-free metallization for interdigitated back contact silicon heterojunction solar cells

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dc.identifier.uri http://dx.doi.org/10.15488/4487
dc.identifier.uri https://www.repo.uni-hannover.de/handle/123456789/4527
dc.contributor.author Stang, Johann-Christoph
dc.contributor.author Hendrichs, Max-Sebastian
dc.contributor.author Merkle, Agnes
dc.contributor.author Peibst, Robby
dc.contributor.author Stannowski, Bernd
dc.contributor.author Korte, Lars
dc.contributor.author Rech, Bernd
dc.date.accessioned 2019-03-06T09:48:58Z
dc.date.available 2019-03-06T09:48:58Z
dc.date.issued 2017
dc.identifier.citation Stang, J.-C.; Hendrichs, M.-S.; Merkle, A.; Peibst, R.; Stannowski, B. et al.: ITO-free metallization for interdigitated back contact silicon heterojunction solar cells. In: Energy Procedia 124 (2017), S. 379-383. DOI: https://doi.org/10.1016/j.egypro.2017.09.253
dc.description.abstract We report on two different approaches to fabricate interdigitated back contact silicon heterojunction solar cells without using indium tin oxide (ITO). The standard ITO/Ag backend is either modified by replacing ITO with aluminum-doped zinc oxide (AZO) or completely replaced by a sole aluminum (Al) layer. The very transparent AZO enhances the optical properties at the rear side resulting in an increase in short-circuit current density. The efficiency of the AZO cells remains on the level of the ITO ones, as the fill factor drops slightly. On the contrary, the contact resistivity of annealed Al, in comparison to ITO and AZO, to the emitter and BSF layers is much lower, thus the fill factor is increased. Despite lower open circuit voltages, cells with Al achieve efficiencies of up 22 %, a gain of 0.5 %abs compared to the ITO reference. eng
dc.language.iso eng
dc.publisher London : Elsevier Ltd.
dc.relation.ispartofseries Energy Procedia 124 (2017)
dc.rights CC BY-NC-ND 4.0 Unported
dc.rights.uri https://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subject aluminium eng
dc.subject aluminum doped zinc-oxide eng
dc.subject back contact eng
dc.subject ITO eng
dc.subject metallization eng
dc.subject silicon heterojunction eng
dc.subject Efficiency eng
dc.subject Heterojunctions eng
dc.subject Metallizing eng
dc.subject Open circuit voltage eng
dc.subject Optical films eng
dc.subject Optical properties eng
dc.subject Silicon eng
dc.subject Silicon solar cells eng
dc.subject Solar cells eng
dc.subject Tin oxides eng
dc.subject Zinc eng
dc.subject Zinc oxide eng
dc.subject Aluminum (Al) eng
dc.subject Aluminum-doped zinc oxide eng
dc.subject Back contact eng
dc.subject Contact resistivities eng
dc.subject Fill factor eng
dc.subject Indium tin oxide eng
dc.subject Interdigitated back contacts eng
dc.subject Silicon heterojunctions eng
dc.subject Aluminum eng
dc.subject.classification Konferenzschrift ger
dc.subject.ddc 620 | Ingenieurwissenschaften und Maschinenbau ger
dc.title ITO-free metallization for interdigitated back contact silicon heterojunction solar cells
dc.type Article
dc.type Text
dc.relation.issn 1876-6102
dc.relation.doi https://doi.org/10.1016/j.egypro.2017.09.253
dc.bibliographicCitation.volume 124
dc.bibliographicCitation.firstPage 379
dc.bibliographicCitation.lastPage 383
dc.description.version publishedVersion
tib.accessRights frei zug�nglich


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