dc.identifier.uri |
http://dx.doi.org/10.15488/16414 |
|
dc.identifier.uri |
https://www.repo.uni-hannover.de/handle/123456789/16541 |
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dc.contributor.author |
Schwyn Thöny, S.
|
|
dc.contributor.author |
Bärtschi, M.
|
|
dc.contributor.author |
Batzer, M.
|
|
dc.contributor.author |
Baselgia, M.
|
|
dc.contributor.author |
Waldner, S.
|
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dc.contributor.author |
Steinecke, M.
|
|
dc.contributor.author |
Badorreck, H.
|
|
dc.contributor.author |
Wienke, A.
|
|
dc.contributor.author |
Jupé, M.
|
|
dc.date.accessioned |
2024-02-27T11:45:25Z |
|
dc.date.available |
2024-02-27T11:45:25Z |
|
dc.date.issued |
2023 |
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dc.identifier.citation |
Schwyn Thöny, S.; Bärtschi, M.; Batzer, M.; Baselgia, M.; Waldner, S. et al.: Magnetron sputter deposition of Ta2O5-SiO2 quantized nanolaminates. In: Optics Express 31 (2023), Nr. 10, 15825. DOI: https://doi.org/10.1364/oe.487892 |
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dc.description.abstract |
Quantized nanolaminates are a type of optical metamaterials, which were discovered only recently. Their feasibility was demonstrated by atomic layer deposition and ion beam sputtering so far. In this paper, we will report on the successful magnetron sputter deposition of quantized nanolaminates based on Ta2O5-SiO2. We will describe the deposition process, show results and material characterization of films deposited in a very wide parameter range. Furthermore, we will show how quantized nanolaminates deposited by magnetron sputtering were used in optical interference coatings such as antireflection and mirror coatings. |
eng |
dc.language.iso |
eng |
|
dc.publisher |
Washington, DC : Optica |
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dc.relation.ispartofseries |
Optics Express 31 (2023), Nr. 10 |
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dc.rights |
Optica Open Access Publishing Agreement |
|
dc.rights.uri |
https://opg.optica.org/library/license_v2.cfm#VOR-OA |
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dc.subject |
Atomic layer deposition |
eng |
dc.subject |
Ion beams |
eng |
dc.subject |
Magnetron sputtering |
eng |
dc.subject |
Optical coatings |
eng |
dc.subject |
Optical materials |
eng |
dc.subject |
Silicon |
eng |
dc.subject |
Tantalum oxides |
eng |
dc.subject |
Atomic-layer deposition |
eng |
dc.subject |
Deposition process |
eng |
dc.subject |
Ion-beam-sputtering |
eng |
dc.subject |
Magnetron sputter deposition |
eng |
dc.subject |
Magnetron-sputtering |
eng |
dc.subject |
Materials characterization |
eng |
dc.subject |
Nano-laminates |
eng |
dc.subject |
Optical interference coatings |
eng |
dc.subject |
Optical metamaterials |
eng |
dc.subject |
Parameter range |
eng |
dc.subject |
magnetron sputtering |
eng |
dc.subject |
Silica |
eng |
dc.subject.ddc |
530 | Physik
|
|
dc.title |
Magnetron sputter deposition of Ta2O5-SiO2 quantized nanolaminates |
eng |
dc.type |
Article |
|
dc.type |
Text |
|
dc.relation.essn |
1094-4087 |
|
dc.relation.doi |
https://doi.org/10.1364/oe.487892 |
|
dc.bibliographicCitation.issue |
10 |
|
dc.bibliographicCitation.volume |
31 |
|
dc.bibliographicCitation.firstPage |
15825 |
|
dc.description.version |
publishedVersion |
eng |
tib.accessRights |
frei zug�nglich |
|
dc.bibliographicCitation.articleNumber |
15825 |
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