Magnetron sputter deposition of Ta2O5-SiO2 quantized nanolaminates

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dc.identifier.uri http://dx.doi.org/10.15488/16414
dc.identifier.uri https://www.repo.uni-hannover.de/handle/123456789/16541
dc.contributor.author Schwyn Thöny, S.
dc.contributor.author Bärtschi, M.
dc.contributor.author Batzer, M.
dc.contributor.author Baselgia, M.
dc.contributor.author Waldner, S.
dc.contributor.author Steinecke, M.
dc.contributor.author Badorreck, H.
dc.contributor.author Wienke, A.
dc.contributor.author Jupé, M.
dc.date.accessioned 2024-02-27T11:45:25Z
dc.date.available 2024-02-27T11:45:25Z
dc.date.issued 2023
dc.identifier.citation Schwyn Thöny, S.; Bärtschi, M.; Batzer, M.; Baselgia, M.; Waldner, S. et al.: Magnetron sputter deposition of Ta2O5-SiO2 quantized nanolaminates. In: Optics Express 31 (2023), Nr. 10, 15825. DOI: https://doi.org/10.1364/oe.487892
dc.description.abstract Quantized nanolaminates are a type of optical metamaterials, which were discovered only recently. Their feasibility was demonstrated by atomic layer deposition and ion beam sputtering so far. In this paper, we will report on the successful magnetron sputter deposition of quantized nanolaminates based on Ta2O5-SiO2. We will describe the deposition process, show results and material characterization of films deposited in a very wide parameter range. Furthermore, we will show how quantized nanolaminates deposited by magnetron sputtering were used in optical interference coatings such as antireflection and mirror coatings. eng
dc.language.iso eng
dc.publisher Washington, DC : Optica
dc.relation.ispartofseries Optics Express 31 (2023), Nr. 10
dc.rights Optica Open Access Publishing Agreement
dc.rights.uri https://opg.optica.org/library/license_v2.cfm#VOR-OA
dc.subject Atomic layer deposition eng
dc.subject Ion beams eng
dc.subject Magnetron sputtering eng
dc.subject Optical coatings eng
dc.subject Optical materials eng
dc.subject Silicon eng
dc.subject Tantalum oxides eng
dc.subject Atomic-layer deposition eng
dc.subject Deposition process eng
dc.subject Ion-beam-sputtering eng
dc.subject Magnetron sputter deposition eng
dc.subject Magnetron-sputtering eng
dc.subject Materials characterization eng
dc.subject Nano-laminates eng
dc.subject Optical interference coatings eng
dc.subject Optical metamaterials eng
dc.subject Parameter range eng
dc.subject magnetron sputtering eng
dc.subject Silica eng
dc.subject.ddc 530 | Physik
dc.title Magnetron sputter deposition of Ta2O5-SiO2 quantized nanolaminates eng
dc.type Article
dc.type Text
dc.relation.essn 1094-4087
dc.relation.doi https://doi.org/10.1364/oe.487892
dc.bibliographicCitation.issue 10
dc.bibliographicCitation.volume 31
dc.bibliographicCitation.firstPage 15825
dc.description.version publishedVersion eng
tib.accessRights frei zug�nglich
dc.bibliographicCitation.articleNumber 15825


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