Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity

Abstract

The exploitation of nonlinear effects in multi-layer thin films allows for optics with novel functions, such as all-optical switching and frequency conversion. In this contribution, an improved interferometric setup for the measurement of the nonlinear refractive index in dielectric substrates and deposited single layers is presented. The setup is based on the wave front deformation caused by the self-focusing in the measured samples. Additionally, measurement results for a highly nonlinear material, indium-Tin-oxide (ITO) are presented with respect to the materials power handling capabilities and compared to values from other materials. © COPYRIGHT SPIE