dc.identifier.uri |
http://dx.doi.org/10.15488/10266 |
|
dc.identifier.uri |
https://www.repo.uni-hannover.de/handle/123456789/10339 |
|
dc.contributor.author |
Steinecke, Morten
|
|
dc.contributor.author |
Kellermann, Tarik
|
|
dc.contributor.author |
Jupé, Marco
|
|
dc.contributor.author |
Ristau, Detlev
|
|
dc.contributor.author |
Jensen, Lars
|
|
dc.contributor.editor |
Wren Carr, Christopher
|
|
dc.contributor.editor |
Exarhos, Gregory J.
|
|
dc.contributor.editor |
Gruzdev, Vitaly E.
|
|
dc.contributor.editor |
Ristau, Detlev
|
|
dc.contributor.editor |
Soileau, M.J.
|
|
dc.date.accessioned |
2020-12-08T15:27:05Z |
|
dc.date.available |
2020-12-08T15:27:05Z |
|
dc.date.issued |
2018 |
|
dc.identifier.citation |
Steinecke, M.; Kellermann, T.; Jupé, M.; Ristau, D.; Jensen, L.: Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity. In: Proceedings of SPIE 10805 (2018), 1080524. DOI: https://doi.org/10.1117/12.2500341 |
|
dc.description.abstract |
The exploitation of nonlinear effects in multi-layer thin films allows for optics with novel functions, such as all-optical switching and frequency conversion. In this contribution, an improved interferometric setup for the measurement of the nonlinear refractive index in dielectric substrates and deposited single layers is presented. The setup is based on the wave front deformation caused by the self-focusing in the measured samples. Additionally, measurement results for a highly nonlinear material, indium-Tin-oxide (ITO) are presented with respect to the materials power handling capabilities and compared to values from other materials. © COPYRIGHT SPIE |
eng |
dc.language.iso |
eng |
|
dc.publisher |
Bellingham : SPIE |
|
dc.relation.ispartofseries |
Proceedings of SPIE 10805 (2018) |
|
dc.rights |
Es gilt deutsches Urheberrecht. Das Dokument darf zum eigenen Gebrauch kostenfrei genutzt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden. Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich. |
|
dc.subject |
Kerr-effect |
eng |
dc.subject |
Material science |
eng |
dc.subject |
Nonlinear optics |
eng |
dc.subject |
Self-focusing |
eng |
dc.subject |
Thin films |
eng |
dc.subject.classification |
Konferenzschrift |
ger |
dc.subject.ddc |
620 | Ingenieurwissenschaften und Maschinenbau
|
ger |
dc.title |
Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity |
eng |
dc.type |
BookPart |
|
dc.type |
Text |
|
dc.relation.essn |
1996-756X |
|
dc.relation.isbn |
978-1-5106-2194-7 |
|
dc.relation.issn |
0277-786X |
|
dc.relation.doi |
https://doi.org/10.1117/12.2500341 |
|
dc.bibliographicCitation.volume |
10805 |
|
dc.bibliographicCitation.firstPage |
1080524 |
|
dc.description.version |
publishedVersion |
|
tib.accessRights |
frei zug�nglich |
|