Turowski, M.; Jupé, M.; Melzig, T.; Pflug, A.; Ristau, D.: Multiple scale modeling of Al2O3 thin film growth in an ion beam sputtering process. In: Proceedings of SPIE - The International Society for Optical Engineering 9627 (2015), 96271M. DOI:
https://doi.org/10.1117/12.2191049
Abstract: |
A multiple scale model approach is presented in order to investigate Al2O3 thin film growth in the framework of an existing Ion Beam Sputtering (IBS) coating process. Therefore, several simulation techniques are combined via optimized interfaces for realizing the concept of a virtual coater. Characteristic coating process parameters of the IBS coating plant are applied as input parameters to model the material transport in the chamber, the energy and angular distribution of the coating material at the substrate, the formation of structural thin film properties, and the optical as well as the electronic layer properties. The resulting thin film properties are validated to the data of an experimental IBS Al2O3 single layer prepared applying the underlying coating facility. The comparison accounts for a good agreement between the modeled layer properties using the virtual coater concept and the experimental characterization data. © 2015 SPIE.
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License of this version: |
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Publication type: |
BookPart |
Publishing status: |
publishedVersion |
Publication date: |
2015 |
Keywords english: |
Density Functional Theory, Direct Simulation Monte Carlo, Ion Beam Sputtering, Modeling, Molecular Dynamics, thin film growth, Aluminum, Aluminum coatings, Angular distribution, Characterization, Coatings, Density functional theory, Film growth, Ion beams, Ions, Models, Molecular dynamics, Monte Carlo methods, Sputtering, Substrates, Systems analysis, Thin films, Coating process parameter, Direct simulation Monte Carlo, Experimental characterization, Ion-beam sputtering, Material transport, Multiple scale models, Simulation technique, Thin-film properties, Optical films
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DDC: |
530 | Physik
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Controlled keywords(GND): |
Konferenzschrift
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