A round Robin-Highliting on the passivating contact technology

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dc.identifier.uri http://dx.doi.org/10.15488/14619
dc.identifier.uri https://www.repo.uni-hannover.de/handle/123456789/14737
dc.contributor.author Fellmeth, Tobias
dc.contributor.author Feldmann, Frank
dc.contributor.author Steinhauser, Bernd
dc.contributor.author Nagel, Henning
dc.contributor.author Mack, Sebastian
dc.contributor.author Hermle, Martin
dc.contributor.author Torregrosa, Frank
dc.contributor.author Ingenito, Andrea
dc.contributor.author Haug, Franz-Josef
dc.contributor.author Morisset, Audrey
dc.contributor.author Buchholz, Florian
dc.contributor.author Chaudhary, Aditya
dc.contributor.author Desrues, Thibaut
dc.contributor.author Haase, Felix
dc.contributor.author Min, Byungsul
dc.contributor.author Peibst, Robby
dc.contributor.author Tous, Loic
dc.date.accessioned 2023-09-01T04:26:54Z
dc.date.available 2023-09-01T04:26:54Z
dc.date.issued 2021
dc.identifier.citation Fellmeth, T.; Feldmann, F.; Steinhauser, B.; Nagel, H.; Mack, S. et al.: A round Robin-Highliting on the passivating contact technology. In: EPJ Photovoltaics 12 (2021), 12. DOI: https://doi.org/10.1051/epjpv/2021011
dc.description.abstract The aim of this work is to demonstrate the maturity of the TOPCon technology by conducting a round-robin on symmetrically processed lifetime samples in the leading European PV institutes EPFL, ISC, CEA-INES, ISFH, IMEC and Fraunhofer ISE within the H2020 funded project called HighLite. For all layers, dark saturation current-densities ranging between 2 and 10 fA/cm2 can be reported. Simultaneously, no metal induced recombination for the two lower sintering temperatures have been observed pointing towards a true passivated contact. Furthermore, contact resistivities below 10 mωcm2 have been achieved. It seems that the industrial passivating contact matured to a fully passivated and conducting contact enabling full efficiency potential. The fact that this can be realized using either PECVD or LPCVD from various manufacturer is expected to drive costs down and contribute to the increased adoption of the TOPCon technology. eng
dc.language.iso eng
dc.publisher Les Ulis : EDP Sciences
dc.relation.ispartofseries EPJ Photovoltaics 12 (2021)
dc.rights CC BY 4.0 Unported
dc.rights.uri https://creativecommons.org/licenses/by/4.0
dc.subject Passivated contact eng
dc.subject POLO eng
dc.subject Round robin eng
dc.subject Silicon solar cell eng
dc.subject TOPCon eng
dc.subject.ddc 600 | Technik
dc.subject.ddc 670 | Industrielle und handwerkliche Fertigung
dc.title A round Robin-Highliting on the passivating contact technology eng
dc.type Article
dc.type Text
dc.relation.essn 2105-0716
dc.relation.doi https://doi.org/10.1051/epjpv/2021011
dc.bibliographicCitation.volume 12
dc.bibliographicCitation.firstPage 12
dc.description.version publishedVersion
tib.accessRights frei zug�nglich


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