Continuous detection of particles on a rotating substrate during thin film deposition

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dc.identifier.uri Rüsseler, Anna Karoline Balasa, Istvan Jensen, Lars Ristau, Detlev 2020-12-08T15:27:04Z 2020-12-08T15:27:04Z 2018
dc.identifier.citation Rüsseler, A.K.; Balasa, I.; Jensen, L.; Ristau, D.: Continuous detection of particles on a rotating substrate during thin film deposition. In: Proceedings of SPIE 10805 (2018), 108051X. DOI:
dc.description.abstract Particles, which contaminate the substrate during thin film deposition, are prone to cause irremovable defects and demand special attention in the field of high precision laser optics as they can lead to localized absorption and laser damage. In this contribution, we present a camera based fully in-vacuum device which continuously monitors the coating surface of a transparent test substrate under dark field illumination. We show the possibilities of this setup regarding the sensitivity to small particles (diameter 1 μm). As the first operational test of the particle monitor, singe layers of HfO 2 are grown on fused silica. By analyzing the evolution of the scattering intensity of the particles, we derive their position in the substrate-coating-system. Therefore, this in situ particle detection concept can deliver data on which process step is responsible for particle generation in multilayer films and aims to be a tool to minimize coating defects. © COPYRIGHT SPIE. eng
dc.language.iso eng
dc.publisher Bellingham : SPIE
dc.relation.ispartofseries Proceedings of SPIE 10805 (2018)
dc.rights Es gilt deutsches Urheberrecht. Das Dokument darf zum eigenen Gebrauch kostenfrei genutzt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden. Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich.
dc.subject Coatings eng
dc.subject Defects eng
dc.subject In situ monitoring eng
dc.subject Laser damage eng
dc.subject Particles eng
dc.subject Sputter deposition eng
dc.subject Thin films eng
dc.subject.ddc 620 | Ingenieurwissenschaften und Maschinenbau ger
dc.title Continuous detection of particles on a rotating substrate during thin film deposition eng
dc.type conferenceObject
dc.type article
dc.type Text
dc.bibliographicCitation.volume 10805
dc.bibliographicCitation.firstPage 108051X
dc.description.version publishedVersion
tib.accessRights frei zug�nglich

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