dc.identifier.uri |
http://dx.doi.org/10.15488/1759 |
|
dc.identifier.uri |
http://www.repo.uni-hannover.de/handle/123456789/1784 |
|
dc.contributor.author |
Rahlves, Maik
|
|
dc.contributor.editor |
Tabor, Christopher E.
|
|
dc.contributor.editor |
Kajzar, François
|
|
dc.contributor.editor |
Kaino, Toshikuni
|
|
dc.contributor.editor |
Koike, Yasuhiro
|
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dc.date.accessioned |
2017-08-08T08:49:50Z |
|
dc.date.available |
2017-08-08T08:49:50Z |
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dc.date.issued |
2016 |
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dc.identifier.citation |
Rahlves, M.: Fabrication of polymer based integrated photonic devices by maskless lithography. In: Proceedings of SPIE - The International Society for Optical Engineering 9745 (2016), 97450D. DOI: https://doi.org/10.1117/12.2213211 |
|
dc.description.abstract |
We present our recent results on the fabrication of photonic devices such as single-mode and few-mode waveguides, Ycouplers as well as integrated interferometric sensor devices. The devices were created by means of a fabrication method based on maskless lithography, which allows for fabricating embedded integrated polymer elements on a scale of several square centimeters with a resolution down to one micron. We demonstrate the versatility of our approach by presenting first results on photonic structures created by maskless lithography. © 2016 SPIE. |
eng |
dc.description.sponsorship |
DFG/SFB/TRR 123 |
|
dc.language.iso |
eng |
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dc.publisher |
Bellingham, WA : S P I E - International Society for Optical Engineering |
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dc.relation.ispartof |
Organic Photonic Materials and Devices XVIII : 15-17 February 2016, San Francisco, California, United States |
|
dc.relation.ispartofseries |
Proceedings of SPIE 9745 (2016) |
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dc.rights |
Es gilt deutsches Urheberrecht. Das Dokument darf zum eigenen Gebrauch kostenfrei genutzt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden. Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich. |
|
dc.subject |
Integrated photonics |
eng |
dc.subject |
Maskless lithography |
eng |
dc.subject |
Polymer photonics |
eng |
dc.subject |
Waveguides |
eng |
dc.subject |
Fabrication |
eng |
dc.subject |
Lithography |
eng |
dc.subject |
Photonics |
eng |
dc.subject |
Polymers |
eng |
dc.subject |
Waveguides |
eng |
dc.subject |
Fabrication method |
eng |
dc.subject |
Integrated photonic devices |
eng |
dc.subject |
Integrated photonics |
eng |
dc.subject |
Integrated polymers |
eng |
dc.subject |
Interferometric sensor |
eng |
dc.subject |
Mask-less lithography |
eng |
dc.subject |
Photonic structure |
eng |
dc.subject |
Polymer photonics |
eng |
dc.subject |
Photonic devices |
eng |
dc.subject.classification |
Konferenzschrift |
ger |
dc.subject.ddc |
530 | Physik
|
ger |
dc.title |
Fabrication of polymer based integrated photonic devices by maskless lithography |
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dc.type |
BookPart |
|
dc.type |
Text |
|
dc.relation.essn |
1996-756X |
|
dc.relation.isbn |
978-1-62841-980-1 |
|
dc.relation.issn |
0277-786X |
|
dc.relation.doi |
https://doi.org/10.1117/12.2213211 |
|
dc.bibliographicCitation.volume |
9745 |
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dc.bibliographicCitation.firstPage |
97450D |
|
dc.description.version |
publishedVersion |
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tib.accessRights |
frei zug�nglich |
|