Langer, T.; Baringhaus, J.; Pfnuer, H.; Schumacher, H. W.; Tegenkamp, C.: Plasmon damping below the Landau regime: the role of defects in epitaxial graphene. In: New Journal of Physics 12 (2010), 33017. DOI:
https://doi.org/10.1088/1367-2630/12/3/033017