Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process

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dc.identifier.uri http://dx.doi.org/10.15488/4662
dc.identifier.uri https://www.repo.uni-hannover.de/handle/123456789/4704
dc.contributor.author Malobabic, Sina
dc.contributor.author Jupé, Marco
dc.contributor.author Ristau, Detlev
dc.date.accessioned 2019-03-28T12:29:35Z
dc.date.available 2019-03-28T12:29:35Z
dc.date.issued 2013
dc.identifier.citation Malobabic, S.; Jupé, M.; Ristau, D.: Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process. In: Applied Physics Letters 102 (2013), Nr. 22, 221604. DOI: https://doi.org/10.1063/1.4807793
dc.description.abstract Nowadays, Ion Beam Sputter (IBS) processes are very well optimized on an empirical basis. To achieve further progresses, a modification of the IBS process by guiding the coating material using an axial magnetic field and an additional electrical field has been studied. The electro-magnetic (EM) field leads to a significant change in plasma properties and deposition rate distributions, whereas an increase in deposition rate along the centerline of the axial EM field around 150% was observed. These fundamental studies on the prototype are the basis for the development of an applicable and workable design of a separation device. eng
dc.language.iso eng
dc.publisher College Park, MD : American Institute of Physics
dc.relation.ispartofseries Applied Physics Letters 102 (2013), Nr. 22
dc.rights CC BY 3.0
dc.rights.uri https://creativecommons.org/licenses/by/3.0/
dc.subject Axial magnetic field eng
dc.subject Deposited materials eng
dc.subject Electrical field eng
dc.subject Fundamental studies eng
dc.subject Ion beam sputter eng
dc.subject Plasma properties eng
dc.subject Rate distributions eng
dc.subject Separation devices eng
dc.subject Deposition eng
dc.subject Deposition rates eng
dc.subject Ion beams eng
dc.subject Separation eng
dc.subject.ddc 530 | Physik ger
dc.title Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process
dc.type article
dc.type Text
dc.relation.issn 0003-6951
dc.relation.doi https://doi.org/10.1063/1.4807793
dc.bibliographicCitation.issue 22
dc.bibliographicCitation.volume 102
dc.bibliographicCitation.firstPage 221604
dc.description.version publishedVersion
tib.accessRights frei zug�nglich


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