Atomic layer deposition for high power laser applications: Al2O3 and HfO2

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dc.identifier.uri http://dx.doi.org/10.15488/4208
dc.identifier.uri https://www.repo.uni-hannover.de/handle/123456789/4242
dc.contributor.author Liu, Hao ger
dc.date.accessioned 2018-12-18T12:46:36Z
dc.date.available 2018-12-18T12:46:36Z
dc.date.issued 2018
dc.identifier.citation Liu, Hao: Atomic layer deposition for high power laser applications: Al2O3 and HfO2. Hannover : Gottfried Wilhelm Leibniz Universität, Diss., 2018, vii, 130 S. DOI: https://doi.org/10.15488/4208 ger
dc.description.abstract Optical coatings are essential components reflecting or transmitting light in optical systems. Laser components demand more complex properties of optical coatings, such as precise thickness, uniformity over large area, weak absorption, high laser induced damage threshold (LIDT), low stress, high film density and so on. ALD process is investigated to deposit Al2O3 and HfO2 thin films. The film properties are studied and compared to Ion Beam Sputtering (IBS) Al2O3 and HfO2 single layer films. Anti-reflection coatings for 1ω-4ω of Nd: YAG laser are prepared with ALD HfO2/Al2O3 double layers. The anti-reflection coatings are characterized and compared to the coatings prepared by IBS HfO2/Al2O3. Both ALD HfO2 and Al2O3 have thickness with high resolution due to the self-terminating feature. Thin films can be controlled by counting the cycle number. Both ALD films have uniformity >99% in ϕ60 mm area. At 1064 nm, the ALD single layer films show absorption as weak as 3.7 ppm, and similar LIDT compared to the IBS films. Annealing at 300/400 °C promote the LIDT of ALD Al2O3 by 30%, but does not promote that of ALD HfO2. For 1ω-4ω of Nd: YAG laser, the ALD anti-reflection coatings have generally higher LIDT than IBS coatings. The LIDT of the ALD anti-reflection coating is limited by HfO2 film layer. The damage of both ALD single layers and anti-reflection coatings are induced by defects. ALD films, both single layers and multilayers, were found to have severe tensile stress. A model for the origin of the film stress is established. Taking advantage of the high LIDT and opposite stress of ALD and IBS films, a concept is proposed to develop high LIDT and stress compensated coatings with ALD Al2O3 and IBS SiO2. An anti-reflection coating consisting of 4 layers was prepared following this concept. The compensated stress is much smaller than either ALD Al2O3 or IBS SiO2 single layer. The LIDT of the multi-layer is lower than the single layers because of the defects introduced during shift between the ALD and IBS coating chambers. This concept has potential application in high power laser components if a proper coating plant is developed to reduce the defects. ALD films have high density, thus could be used as capping layer against vacuum-air-shift when the environment changes. The capping effect of ALD Al2O3 on evaporated Ta2O5/SiO2 multilayers was studied and discussed. The application of ALD films in nanolaminates and chirped mirror is discussed. The study in this thesis indicates the high versatility of ALD films for applications in high-power coatings. ger
dc.language.iso eng ger
dc.publisher Hannover : Institutionelles Repositorium der Leibniz Universität Hannover
dc.rights CC BY 3.0 DE ger
dc.rights.uri http://creativecommons.org/licenses/by/3.0/de/ ger
dc.subject anti-reflection coating eng
dc.subject weak absorption eng
dc.subject stress eng
dc.subject film density eng
dc.subject atomic layer deposition ger
dc.subject Al2O3 ger
dc.subject HfO2 ger
dc.subject Antireflexschichten ger
dc.subject geringe Absorption ger
dc.subject laser induced damage ger
dc.subject Spannung ger
dc.subject Filmdichte ger
dc.subject.ddc 530 | Physik ger
dc.title Atomic layer deposition for high power laser applications: Al2O3 and HfO2 eng
dc.type doctoralThesis ger
dc.type Text ger
dc.description.version publishedVersion ger
tib.accessRights frei zug�nglich ger


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