dc.identifier.uri |
http://dx.doi.org/10.15488/2830 |
|
dc.identifier.uri |
http://www.repo.uni-hannover.de/handle/123456789/2856 |
|
dc.contributor.author |
Hapke-Wurst, I.
|
|
dc.contributor.author |
Zeitler, U.
|
|
dc.contributor.author |
Keyser, U.F.
|
|
dc.contributor.author |
Haug, Rolf J.
|
|
dc.contributor.author |
Pierz, Klaus
|
|
dc.contributor.author |
Ma, Z.
|
|
dc.date.accessioned |
2018-02-23T10:08:38Z |
|
dc.date.available |
2018-02-23T10:08:38Z |
|
dc.date.issued |
2003 |
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dc.identifier.citation |
Hapke-Wurst, I.; Zeitler, U.; Keyser, U.F.; Haug, R.J.; Pierz, K.; Ma, Z.: Tuning the onset voltage of resonant tunneling through InAs quantum dots by growth parameters. In: Applied Physics Letters 82 (2003), Nr. 8, S. 1209-1211. DOI: https://doi.org/10.1063/1.1555712 |
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dc.description.abstract |
A study was conducted on the onset voltage of resonant tunneling through indium arsenide (InAs) quantum dots by growth parameters. It was found that the onset voltage of the first step decreased from 200 mV to 0 with increasing InAs coverage. The results were confirmed by atomic force micrographs and photoluminescence experiments on reference samples. |
eng |
dc.language.iso |
eng |
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dc.publisher |
College Park, MD : American Institute of Physics |
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dc.relation.ispartofseries |
Applied Physics Letters 82 (2003), Nr. 8 |
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dc.rights |
Es gilt deutsches Urheberrecht. Das Dokument darf zum eigenen Gebrauch kostenfrei genutzt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden. |
|
dc.subject |
Atomic force microscopy |
eng |
dc.subject |
Current voltage characteristics |
eng |
dc.subject |
Ground state |
eng |
dc.subject |
Molecular beam epitaxy |
eng |
dc.subject |
Photoluminescence |
eng |
dc.subject |
Resonant tunneling |
eng |
dc.subject |
Self assembly |
eng |
dc.subject |
Semiconducting indium compounds |
eng |
dc.subject |
Onset voltage |
eng |
dc.subject |
Semiconductor quantum dots |
eng |
dc.subject.ddc |
530 | Physik
|
ger |
dc.title |
Tuning the onset voltage of resonant tunneling through InAs quantum dots by growth parameters |
eng |
dc.type |
Article |
|
dc.type |
Text |
|
dc.relation.issn |
00036951 |
|
dc.relation.doi |
https://doi.org/10.1063/1.1555712 |
|
dc.bibliographicCitation.issue |
8 |
|
dc.bibliographicCitation.volume |
82 |
|
dc.bibliographicCitation.firstPage |
1209 |
|
dc.bibliographicCitation.lastPage |
1211 |
|
dc.description.version |
publishedVersion |
|
tib.accessRights |
frei zug�nglich |
|