Precise fabrication of ultra violet dielectric dispersion compensating mirrors

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dc.identifier.uri http://dx.doi.org/10.15488/1780
dc.identifier.uri http://www.repo.uni-hannover.de/handle/123456789/1805
dc.contributor.author Willemsen, Thomas
dc.contributor.author Schlichting, S.
dc.contributor.author Kellermann, T.
dc.contributor.author Jupé, Marco
dc.contributor.author Ehlers, H.
dc.contributor.author Morgner, Uwe
dc.contributor.author Ristau, Detlev
dc.date.accessioned 2017-08-08T11:57:13Z
dc.date.available 2017-08-08T11:57:13Z
dc.date.issued 2015
dc.identifier.citation Willemsen, T.; Schlichting, S.; Kellermann, T.; Jupé, M.; Ehlers, H. et al.: Precise fabrication of ultra violet dielectric dispersion compensating mirrors. In: Proceedings of SPIE - The International Society for Optical Engineering 9627 (2015), 96271U. DOI: https://doi.org/10.1117/12.2191051
dc.description.abstract The present contribution is concentrated on an improved method to manufacture dielectric dispersion compensating mirrors in the ultra violet (UV) range by applying a novel online phase monitoring device. This newly developed measurement tool monitors the group delay (GD) and group delay dispersion (GDD) of the electromagnetic field in situ during the deposition of the layer system. Broad band monitoring of the phase enhances the accuracy in the near infrared spectral range (NIR), significantly. In this study, the correlation of the GDD in the NIR and in the UV spectral range is investigated. A design synthesis is introduced to achieve optimum reflection and GDD target values in the UV and NIR. This requires a similar behavior of both bands according to deposition errors, to guarantee switching off the UV GDD target band proper, while monitoring the GDD in the NIR spectral range. The synthesis results in a design, characterized by a GDD of -100fs2±20fs2 between 330nm and 360nm in the UV and by -450fs2±10fs2 within 820nm to 870nm in the NIR. The fabricated sample, applying an ion beam sputtering process, consists of a 9μm layer stack of Hafnium oxide and Silicon dioxide. The first layers of the stack are switched and controlled by a conventional in situ spectrometric broad band monitoring in conjunction with a forward re-optimization algorithm, which also manipulates the layers remaining for deposition at each switching event. To accomplish the demanded GDD-spectra, the last layers are controlled by the novel in situ GDD monitor. © 2015 SPIE. eng
dc.description.sponsorship DFG/EXC/QUEST
dc.description.sponsorship DFG/13N11558
dc.language.iso eng
dc.publisher Bellingham, WA : S P I E - International Society for Optical Engineering
dc.relation.ispartof Optical Systems Design 2015: Advances in Optical Thin Films V, September 7-10 2015, Jena, Germany
dc.relation.ispartofseries Proceedings of SPIE 9627 (2015)
dc.rights Es gilt deutsches Urheberrecht. Das Dokument darf zum eigenen Gebrauch kostenfrei genutzt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden. Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich.
dc.subject chirp mirror eng
dc.subject design synthesis eng
dc.subject GDD eng
dc.subject IBS process eng
dc.subject in situ measurement eng
dc.subject ultra fast optics eng
dc.subject UV mirror eng
dc.subject Algorithms eng
dc.subject Deposition eng
dc.subject Design eng
dc.subject Dispersion compensation eng
dc.subject Electromagnetic fields eng
dc.subject Group delay eng
dc.subject Hafnium oxides eng
dc.subject Ion beams eng
dc.subject Lanthanum compounds eng
dc.subject Mirrors eng
dc.subject Optimization eng
dc.subject Sputtering eng
dc.subject Systems analysis eng
dc.subject Thin films eng
dc.subject Design synthesis eng
dc.subject Dispersion compensating eng
dc.subject Group delay dispersion eng
dc.subject In-situ measurement eng
dc.subject Near infrared spectral eng
dc.subject Precise fabrications eng
dc.subject Re-optimization algorithms eng
dc.subject Ultrafast optics eng
dc.subject Infrared devices eng
dc.subject.ddc 530 | Physik ger
dc.title Precise fabrication of ultra violet dielectric dispersion compensating mirrors
dc.type article
dc.type conferenceObject
dc.type Text
dc.relation.issn 0277-786X
dc.relation.doi https://doi.org/10.1117/12.2191051
dc.bibliographicCitation.volume 9627
dc.bibliographicCitation.firstPage 96271U
dc.description.version publishedVersion
tib.accessRights frei zug�nglich


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