Direct in situ GDD measurement in optical coating process

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dc.identifier.uri http://dx.doi.org/10.15488/1756
dc.identifier.uri http://www.repo.uni-hannover.de/handle/123456789/1781
dc.contributor.author Schlichting, S.
dc.contributor.author Willemsen, Thomas
dc.contributor.author Ehlers, H.
dc.contributor.author Morgner, Uwe
dc.contributor.author Ristau, Detlev
dc.contributor.editor Lequime, Michel
dc.contributor.editor Macleod, H. Angus
dc.contributor.editor Ristau, Detlev
dc.date.accessioned 2017-08-08T08:49:50Z
dc.date.available 2017-08-08T08:49:50Z
dc.date.issued 2015
dc.identifier.citation Schlichting, S.; Willemsen, T.; Ehlers, H.; Morgner, U.; Ristau, D.: Direct in situ GDD measurement in optical coating process. In: Proceedings of SPIE - The International Society for Optical Engineering 9627 (2015), 96271S. DOI: https://doi.org/10.1117/12.2191215
dc.description.abstract In the presented work a fast frequency domain measurement system to determine group delay (GD) and group delay dispersion (GDD) of optical coatings is proposed. The measurements are performed in situ directly on moving substrates during the thin film coating process. The method is based on a Michelson interferometer, which is equipped with a high power broad band light source and a fast spectrometer. Especially for the production of chirped mirrors it is advantageous to obtain group delay and group delay dispersion data of the last layers. This additional information allows for online corrections of coating errors to enhance the precision of complex interference filters for short pulse applications. © 2015 SPIE. eng
dc.language.iso eng
dc.publisher Bellingham, WA : S P I E - International Society for Optical Engineering
dc.relation.ispartofseries Proceedings of SPIE 9627 (2015)
dc.rights Es gilt deutsches Urheberrecht. Das Dokument darf zum eigenen Gebrauch kostenfrei genutzt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden. Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich.
dc.subject chirped mirrors eng
dc.subject FTSI eng
dc.subject GD eng
dc.subject GDD eng
dc.subject in situ measurement eng
dc.subject optical coatings eng
dc.subject optical thin films eng
dc.subject STFT eng
dc.subject Coatings eng
dc.subject Dispersions eng
dc.subject Frequency domain analysis eng
dc.subject Gadolinium eng
dc.subject Group delay eng
dc.subject Laser mirrors eng
dc.subject Light sources eng
dc.subject Michelson interferometers eng
dc.subject Mirrors eng
dc.subject Optical coatings eng
dc.subject Systems analysis eng
dc.subject Thin films eng
dc.subject Ultrashort pulses eng
dc.subject Chirped mirrors eng
dc.subject FTSI eng
dc.subject In-situ measurement eng
dc.subject Optical thin films eng
dc.subject STFT eng
dc.subject Optical films eng
dc.subject.classification Konferenzschrift ger
dc.subject.ddc 530 | Physik ger
dc.title Direct in situ GDD measurement in optical coating process eng
dc.type BookPart
dc.type Text
dc.relation.essn 1996-756X
dc.relation.isbn 978-1-62841-816-3
dc.relation.issn 0277-786X
dc.relation.doi https://doi.org/10.1117/12.2191215
dc.bibliographicCitation.volume 9627
dc.bibliographicCitation.firstPage 96271S
dc.description.version publishedVersion
tib.accessRights frei zug�nglich


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