Impact of deposition conditions on nanostructured anisotropic silica thin films in multilayer interference coatings

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dc.identifier.uri http://dx.doi.org/10.15488/12341
dc.identifier.uri https://www.repo.uni-hannover.de/handle/123456789/12440
dc.contributor.author Grineviciute, Lina
dc.contributor.author Badorreck, Holger
dc.contributor.author Jensen, Lars
dc.contributor.author Ristau, Detlev
dc.contributor.author Jupé, Marco
dc.contributor.author Selskis, Algirdas
dc.contributor.author Tolenis, Tomas
dc.date.accessioned 2022-06-27T04:36:59Z
dc.date.available 2022-06-27T04:36:59Z
dc.date.issued 2021
dc.identifier.citation Grineviciute, L.; Badorreck, H.; Jensen, L.; Ristau, D.; Jupé, M. et al.: Impact of deposition conditions on nanostructured anisotropic silica thin films in multilayer interference coatings. In: Applied Surface Science 562 (2021), 150167. DOI: https://doi.org/10.1016/j.apsusc.2021.150167
dc.description.abstract Recent developments of nanostructured coatings have reached a point where extensive investigations within multi-layer systems are necessary for further implementation in novel photonic systems. Although sculptured thin films are explored for decades, no optical and structural measurements have been performed for anisotropic nanostructured multi-layer coatings with different deposition conditions of the dense layer. In this paper, we present extensive morphological analysis on silica nanostructured anisotropic films. Changing the deposition angle from 66° to 84°, indicate the changes in surface filling from 84% to 57%, respectively, while phase retardance has a maximal value of 0.032°/nm at 70° and 72° angles. We also present the investigation of covering such structures with the dense layer at different conditions. As a result, the technology for maintaining initial anisotropic properties is developed for extending spectral difference 1.6 times and phase retardation by 5% in anisotropic multi-layer coatings. Furthermore, we present simulations of growing silica layer using experimental conditions in the Virtual Coater framework resulting in virtual anisotropic films for comparison with measurements. The minimal impact on the anisotropy of porous layer is reached with the deposition of dense layer at 30° angle during constant substrate rotation. © 2021 eng
dc.language.iso eng
dc.publisher Amsterdam : Elsevier
dc.relation.ispartofseries Applied Surface Science 562 (2021)
dc.rights CC BY-NC-ND 4.0 Unported
dc.rights.uri https://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subject Anisotropic coatings eng
dc.subject Effective refractive index eng
dc.subject Molecular dynamics eng
dc.subject Phase retardance eng
dc.subject Sculptured thin films eng
dc.subject Surface filling eng
dc.subject.ddc 670 | Industrielle und handwerkliche Fertigung ger
dc.subject.ddc 530 | Physik ger
dc.subject.ddc 660 | Technische Chemie ger
dc.title Impact of deposition conditions on nanostructured anisotropic silica thin films in multilayer interference coatings
dc.type article
dc.type Text
dc.relation.essn 1873-5584
dc.relation.issn 0169-4332
dc.relation.doi https://doi.org/10.1016/j.apsusc.2021.150167
dc.bibliographicCitation.volume 562
dc.bibliographicCitation.firstPage 150167
dc.description.version publishedVersion
tib.accessRights frei zug�nglich


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