Wet chemical polishing for industrial type PERC solar cells

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dc.identifier.uri http://dx.doi.org/10.15488/1003
dc.identifier.uri http://www.repo.uni-hannover.de/handle/123456789/1027
dc.contributor.author Kranz, Christopher
dc.contributor.author Wyczanowski, Sabrina
dc.contributor.author Baumann, Ulrike
dc.contributor.author Weise, Katrin
dc.contributor.author Klein, Cornelia
dc.contributor.author Delahaye, Franck
dc.contributor.author Dullweber, Thorsten
dc.contributor.author Brendel, Rolf
dc.date.accessioned 2016-12-22T11:58:56Z
dc.date.available 2016-12-22T11:58:56Z
dc.date.issued 2013
dc.identifier.citation Kranz, C.; Wyczanowski, S.; Baumann, U.; Weise, K.; Klein, C.; et al.: Wet chemical polishing for industrial type PERC solar cells. In: Energy Procedia 38 (2013), S. 243-249. DOI: https://doi.org/10.1016/j.egypro.2013.07.273
dc.description.abstract Industrial PERC cell process flows typically apply the polishing of the rear side after texturing as well as the edge isolation after POCl3 diffusion. In this paper, we present a novel single step polishing process which we apply post double sided texturing and diffusion in order to remove the rear emitter and to reduce the rear surface roughness. One challenge is to minimize the etch back of the front side emitter during rear side polishing due to the reactive gas phase of the polishing process. By optimizing the polishing process, we are able to limit the increase of the emitter sheet resistance below 5 Ω/sq. However, the wet cleaning post polishing contributes an additional 20 Ω/sq emitter sheet resistance increase which is subject to further optimization. We compensate the emitter sheet resistance increase due to wet cleaning by applying a 45 Ω/sq POCl3 diffusion instead of a 60 Ω/sq diffusion. The resulting PERC solar cells with polished rear surface post texture and diffusion show conversion efficiencies up to 19.6% which is comparable to the reference PERC cells which apply a rear protection layer instead of a polishing process. eng
dc.description.sponsorship German Federal Ministry for the Environment, Nature Conservation and Nuclear Safety/0325296
dc.description.sponsorship Heraeus Precious Metals
dc.description.sponsorship Rena
dc.description.sponsorship Singulus Technologies
dc.description.sponsorship Solar World
dc.language.iso eng
dc.publisher Amsterdam : Elsevier
dc.relation.ispartofseries Energy Procedia 38 (2013)
dc.rights CC BY-NC-ND 3.0 Unported
dc.rights.uri https://creativecommons.org/licenses/by-nc-nd/3.0/
dc.subject Cleaning sequences eng
dc.subject PERC solar cells eng
dc.subject Screen-printing eng
dc.subject Sheet resistance eng
dc.subject Wet chemical polishing eng
dc.subject.classification Konferenzschrift ger
dc.subject.ddc 600 | Technik ger
dc.subject.ddc 620 | Ingenieurwissenschaften und Maschinenbau ger
dc.subject.ddc 530 | Physik ger
dc.title Wet chemical polishing for industrial type PERC solar cells eng
dc.type Article
dc.type Text
dc.relation.issn 18766102
dc.relation.doi https://doi.org/10.1016/j.egypro.2013.07.273
dc.bibliographicCitation.volume 38
dc.bibliographicCitation.firstPage 243
dc.bibliographicCitation.lastPage 249
dc.description.version publishedVersion
tib.accessRights frei zug�nglich

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