Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process

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Malobabic, S.; Jupé, M.; Ristau, D.: Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process. In: Applied Physics Letters 102 (2013), Nr. 22, 221604. DOI: https://doi.org/10.1063/1.4807793

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Sum total of downloads: 119




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Abstract: 
Nowadays, Ion Beam Sputter (IBS) processes are very well optimized on an empirical basis. To achieve further progresses, a modification of the IBS process by guiding the coating material using an axial magnetic field and an additional electrical field has been studied. The electro-magnetic (EM) field leads to a significant change in plasma properties and deposition rate distributions, whereas an increase in deposition rate along the centerline of the axial EM field around 150% was observed. These fundamental studies on the prototype are the basis for the development of an applicable and workable design of a separation device.
License of this version: CC BY 3.0 Unported
Document Type: Article
Publishing status: publishedVersion
Issue Date: 2013
Appears in Collections:An-Institute

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pos. country downloads
total perc.
1 image of flag of Germany Germany 79 66.39%
2 image of flag of United States United States 17 14.29%
3 image of flag of China China 8 6.72%
4 image of flag of Korea, Republic of Korea, Republic of 4 3.36%
5 image of flag of Canada Canada 3 2.52%
6 image of flag of Russian Federation Russian Federation 2 1.68%
7 image of flag of France France 2 1.68%
8 image of flag of Sweden Sweden 1 0.84%
9 image of flag of Japan Japan 1 0.84%
10 image of flag of Indonesia Indonesia 1 0.84%
    other countries 1 0.84%

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