Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process

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Malobabic, S.; Jupé, M.; Ristau, D.: Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process. In: Applied Physics Letters 102 (2013), Nr. 22, 221604. DOI: https://doi.org/10.1063/1.4807793

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Abstract: 
Nowadays, Ion Beam Sputter (IBS) processes are very well optimized on an empirical basis. To achieve further progresses, a modification of the IBS process by guiding the coating material using an axial magnetic field and an additional electrical field has been studied. The electro-magnetic (EM) field leads to a significant change in plasma properties and deposition rate distributions, whereas an increase in deposition rate along the centerline of the axial EM field around 150% was observed. These fundamental studies on the prototype are the basis for the development of an applicable and workable design of a separation device.
License of this version: CC BY 3.0
Document Type: article
Publishing status: publishedVersion
Issue Date: 2013
Appears in Collections:An-Institute

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1 image of flag of Germany Germany 14 100.00%

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