Thin crystalline macroporous silicon solar cells with ion implanted emitter

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Ernst, M.; Schulte-Huxel, H.; Niepelt, R.; Kajari-Schröder, S.; Brendel, R.: Thin crystalline macroporous silicon solar cells with ion implanted emitter. In: Energy Procedia 38 (2013), S. 910-918. DOI:

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We separate a (34 ± 2) μm-thick macroporous Si layer from an n-type Si wafer by means of electrochemical etching. The porosity is p = (26.2 ± 2.4)%. We use ion implantation to selectively dope the outer surfaces of the macroporous Si layer. No masking of the surface is required. The pores are open during the implantation process. We fabricate a macroporous Si solar cell with an implanted boron emitter at the front side and an implanted phosphorus region at the rear side. The short-circuit current density is 34.8 mA cm-2 and the open-circuit voltage is 562 mV. With a fill factor of 69.1% the cell achieves an energy-conversion efficiency of 13.5%.
License of this version: CC BY-NC-ND 3.0 Unported
Document Type: Article
Publishing status: publishedVersion
Issue Date: 2013
Appears in Collections:Fakultät für Mathematik und Physik

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pos. country downloads
total perc.
1 image of flag of Germany Germany 171 78.08%
2 image of flag of United States United States 21 9.59%
3 image of flag of China China 9 4.11%
4 image of flag of Japan Japan 2 0.91%
5 image of flag of France France 2 0.91%
6 image of flag of Austria Austria 2 0.91%
7 image of flag of Malaysia Malaysia 1 0.46%
8 image of flag of Korea, Republic of Korea, Republic of 1 0.46%
9 image of flag of India India 1 0.46%
10 image of flag of Indonesia Indonesia 1 0.46%
    other countries 8 3.65%

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