Browsing by Subject "Process simulations"

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  • Adaptive cutting force control on a milling machine with hybrid axis configuration 
    Denkena, Berend; Flöter, F. (Amsterdam : Elsevier BV, 2012)
    In the re-contouring process of aircraft engine components, the unknown geometry and inhomogeneous material properties of the workpiece are major challenges. For this reason a new repair process chain is supposed which ...
  • Loss analysis and improvements of industrially fabricated Cz-Si solar cells by means of process and device simulations 
    Steingrube, S.; Wagner, Hannes; Hannebauer, Helge; Gatz, Sebastian; Chen, R.; Dunham, S.T.; Dullweber, Thorsten; Altermatt, Pietro P.; Brendel, Rolf (Amsterdam : Elsevier BV, 2011)
    We model currently fabricated industrial-type screen-printed boron-doped Cz silicon solar cells using a combination of process and device simulations. The model reproduces the experimental results precisely and allows us ...
  • Modeling a thermomechanical NC-simulation 
    Denkena, Berend; Schmidt, A.; Henjes, J.; Niederwestberg, D.; Niebuhr, C. (Amsterdam : Elsevier, 2013)
    This paper presents a method for a NC-Simulation based prediction of shape errors caused by thermal expansions in machining of complex workpieces. In the first part of the paper the basic approach of modeling a thermomechanical ...
  • Simulation based parameterization for process monitoring of machining operations 
    Denkena, Berend; Koeller, M. (Amsterdam : Elsevier, 2013)
    Process monitoring can prevent machine and tool failure in metal-cutting. A successful process monitoring of cutting processes depends on reliable monitoring limits for the process. In industrial applications these limits ...
  • Solar cell emitter design with PV-tailored implantation 
    Ohrdes, Tobias; Steingrube, S.; Wagner, Hannes; Zechner, C.; Letay, G.; Chen, R.; Dunham, S.T.; Altermatt, Pietro P. (Amsterdam : Elsevier BV, 2011)
    A potentially cost-effective ion implanter for solar cells has become commercially available very recently. As the emitter dopant profiles differ from the standard diffusions, a combination of process simulation and device ...