Browsing by Subject "Chemical vapor deposition"

Browsing by Subject "Chemical vapor deposition"

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  • Schmidt, Jan; Werner, Florian; Veith, Boris; Zielke, Dimitri; Steingrube, S.; Altermatt, Pietro P.; Gatz, Sebastian; Dullweber, Thorsten; Brendel, Rolf (Amsterdam : Elsevier BV, 2012)
    The surface passivation properties of aluminium oxide (Al 2O 3) on crystalline Si are compared with the traditional passivation system of silicon nitride (SiN x). It is shown that Al 2O 3 has fundamental advantages over ...
  • Veith, Boris; Werner, Florian; Zielke, Dimitri; Brendel, Rolf; Schmidt, Jan (Amsterdam : Elsevier BV, 2011)
    We measure surface recombination velocities (SRVs) below 10 cm/s on low-resistivity (1.4 Ωcm) p-type crystalline silicon wafers passivated with plasma-assisted and thermal atomic layer deposited (ALD) aluminium oxide (Al2O3) ...
  • Wesang, K.; Von Witzendorff, P.; Hohnholz, A.; Suttmann, O.; Kaierle, S.; Overmeyer, L. (Amsterdam : Elsevier B.V., 2018)
    Often Glass products achieve their component functionality only by a specific surface finishing, such as coating or patterning. Compared to vacuum based CVD and PVD coating techniques, the equipment for wet-chemical ...