Browsing by Subject "Rapid thermal annealing (RTA)"

Now showing items 1-2 of 2

Atomic-Layer-Deposited Al2O3 as Effective Barrier against the Diffusion of Hydrogen from SiNx:H Layers into Crystalline Silicon during Rapid Thermal Annealing

Helmich, Lailah; Walter, Dominic C.; Bredemeier, Dennis; Schmidt, Jan (Weinheim : Wiley-VCH, 2020)

Stacks of hydrogen-lean aluminum oxide, deposited via plasma-assisted atomic-layer-deposition, and hydrogen-rich plasma-enhanced chemical vapor-deposited silicon nitride (SiNx) are applied to boron-doped float-zone silicon ...
Understanding the Light-induced Lifetime Degradation and Regeneration in Multicrystalline Silicon

Bredemeier, Dennis; Walter, Dominic; Herlufsen, Sandra; Schmidt, Jan (London : Elsevier Ltd., 2016)

In this contribution, we focus on improving the fundamental understanding of the carrier lifetime degradation and regeneration observed in block-cast multicrystalline silicon (mc-Si) wafers under illumination at elevated ...

Now showing items 1-2 of 2

Browse