dc.identifier.uri |
http://dx.doi.org/10.15488/4482 |
|
dc.identifier.uri |
https://www.repo.uni-hannover.de/handle/123456789/4522 |
|
dc.contributor.author |
Heinemeyer, Frank
|
|
dc.contributor.author |
Steckenreiter, Verena
|
|
dc.contributor.author |
Kiefer, Fabian
|
|
dc.contributor.author |
Peibst, Robby
|
|
dc.date.accessioned |
2019-03-06T09:34:02Z |
|
dc.date.available |
2019-03-06T09:34:02Z |
|
dc.date.issued |
2015 |
|
dc.identifier.citation |
Heinemeyer, F.; Steckenreiter, V.; Kiefer, F.; Peibst, R.: Hierarchical Etching for Improved Optical Front-side Properties of Monocrystalline Si Solar Cells. In: Energy Procedia 77 (2015), S. 810-815. DOI: https://doi.org/10.1016/j.egypro.2015.07.114 |
|
dc.description.abstract |
We investigate a hierarchical surface structuring process to reduce the optical reflectance of monocrystalline Si solar cells to below the reflectance of state-of-the-art alkaline texturing. First, alkaline texturing is performed, yielding random pyramids with a few micrometers in size. Second, plasma etching forms step-shaped structures smaller than the wavelength of visible light. Eventually, the surface morphology is formed by <111> planes with many steps, edges and inverted pyramids in a few hundreds of nanometers scale. We investigate the reflectance on double-side textured samples with SiNx/Al2O3 front-side and SiNx rear-side passivation. These dielectric stacks exhibit a low reflectance for conventional alkaline textured surfaces. The short circuit current density potential of the best hierarchical structured samples is 0.4 mA/cm2 higher when integrating the AM1.5G spectrum from 300nm to 1000 nm. Furthermore, our results suggest that structures with dimensions smaller than the thickness of an antireflection- and passivation (AR) layer cannot be covered conformal by the AR layer when using plasma-enhanced chemical vapor deposition. Thus, there seems to be a lower limit for the structure size, and wet chemical cleaning sequences – performed after plasma etching - have to be adjusted accordingly. |
eng |
dc.language.iso |
eng |
|
dc.publisher |
London : Elsevier Ltd. |
|
dc.relation.ispartofseries |
Energy Procedia 77 (2015) |
|
dc.rights |
CC BY-NC-ND 4.0 Unported |
|
dc.rights.uri |
https://creativecommons.org/licenses/by-nc-nd/4.0/ |
|
dc.subject |
plasma etching |
eng |
dc.subject |
solar cell |
eng |
dc.subject |
texture |
eng |
dc.subject |
Alkalinity |
eng |
dc.subject |
Chemical cleaning |
eng |
dc.subject |
Monocrystalline silicon |
eng |
dc.subject |
Passivation |
eng |
dc.subject |
Plasma CVD |
eng |
dc.subject |
Plasma enhanced chemical vapor deposition |
eng |
dc.subject |
Plasma etching |
eng |
dc.subject |
Reflection |
eng |
dc.subject |
Silicon nitride |
eng |
dc.subject |
Solar cells |
eng |
dc.subject |
Textures |
eng |
dc.subject |
Alkaline texturing |
eng |
dc.subject |
Anti-reflection |
eng |
dc.subject |
Dielectric stack |
eng |
dc.subject |
Hierarchical surfaces |
eng |
dc.subject |
Optical reflectance |
eng |
dc.subject |
Shaped structures |
eng |
dc.subject |
State of the art |
eng |
dc.subject |
Textured surface |
eng |
dc.subject |
Silicon solar cells |
eng |
dc.subject.classification |
Konferenzschrift |
ger |
dc.subject.ddc |
620 | Ingenieurwissenschaften und Maschinenbau
|
ger |
dc.title |
Hierarchical Etching for Improved Optical Front-side Properties of Monocrystalline Si Solar Cells |
|
dc.type |
Article |
|
dc.type |
Text |
|
dc.relation.issn |
1876-6102 |
|
dc.relation.doi |
https://doi.org/10.1016/j.egypro.2015.07.114 |
|
dc.bibliographicCitation.volume |
77 |
|
dc.bibliographicCitation.firstPage |
810 |
|
dc.bibliographicCitation.lastPage |
815 |
|
dc.description.version |
publishedVersion |
|
tib.accessRights |
frei zug�nglich |
|