In situ spectroscopic ellipsometry as a pathway toward achieving VO2stoichiometry for amorphous vanadium oxide with magnetron sputtering

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dc.identifier.uri http://dx.doi.org/10.15488/16722
dc.identifier.uri https://www.repo.uni-hannover.de/handle/123456789/16849
dc.contributor.author Xu, C.
dc.contributor.author Heinemeyer, F.
dc.contributor.author Dittrich, A.
dc.contributor.author Bäumer, C.
dc.contributor.author Reineke-Koch, R.
dc.date.accessioned 2024-03-21T10:56:54Z
dc.date.available 2024-03-21T10:56:54Z
dc.date.issued 2021
dc.identifier.citation Xu, C.; Heinemeyer, F.; Dittrich, A.; Bäumer, C.; Reineke-Koch, R.: In situ spectroscopic ellipsometry as a pathway toward achieving VO2stoichiometry for amorphous vanadium oxide with magnetron sputtering. In: AIP Advances 11 (2021), Nr. 3, 035126. DOI: https://doi.org/10.1063/5.0041116
dc.description.abstract As a special class of materials, transition metal oxides exhibit in their crystalline phase a variety of interesting properties, such as metal-insulator transition, ferroelectricity, magnetism, superconductivity, and so forth. However, for industrially widely applied methods such as room temperature magnetron sputtering, during initial fabrication steps of these materials, they are mostly amorphous, and control of stoichiometry during fabrication is challenging. It is, therefore, of pivotal importance to control the stoichiometry of transition metal oxides during growth in the amorphous state. One particularly important example for the necessity of stoichiometry control is vanadium dioxide (VO2), where small deviations in stoichiometry during fabrication result in unfavorable changes in the electronic and structural properties, for example, the metal-insulator transition temperature and optical permittivity. In this work, the stoichiometry of amorphous vanadium oxides is adjusted to VO2 using in situ spectroscopic ellipsometry (in situ SE) and verified by x-ray photoelectron spectroscopy. After an annealing process, a monoclinic VO2 crystalline structure is observed through x-ray diffraction at 30 °C. At an elevated temperature of 150 °C, which is higher than the typical metal-insulator transition temperature in VO2 of around 67 °C, a rutile crystalline structure is observed, which verifies the correctness of the stoichiometry of VO2. A Mott metal-insulator transition is revealed by the change in the imaginary part of optical permittivity through SE as well. eng
dc.language.iso eng
dc.publisher New York, NY : American Inst. of Physics
dc.relation.ispartofseries AIP Advances 11 (2021), Nr. 3
dc.rights CC BY 4.0 Unported
dc.rights.uri https://creativecommons.org/licenses/by/4.0/
dc.subject Magnetron sputtering eng
dc.subject Metal insulator boundaries eng
dc.subject Mott insulators eng
dc.subject Nanocrystalline materials eng
dc.subject Oxide minerals eng
dc.subject Permittivity eng
dc.subject Semiconductor insulator boundaries eng
dc.subject Spectroscopic ellipsometry eng
dc.subject Stoichiometry eng
dc.subject Temperature eng
dc.subject Titanium dioxide eng
dc.subject Transition metal oxides eng
dc.subject Transition metals eng
dc.subject Vanadium dioxide eng
dc.subject Vanadium metallography eng
dc.subject X ray photoelectron spectroscopy eng
dc.subject Annealing process eng
dc.subject Crystalline phase eng
dc.subject Crystalline structure eng
dc.subject Electronic and structural properties eng
dc.subject Elevated temperature eng
dc.subject Imaginary parts eng
dc.subject Optical permittivity eng
dc.subject Stoichiometry control eng
dc.subject Metal insulator transition eng
dc.subject.ddc 530 | Physik
dc.title In situ spectroscopic ellipsometry as a pathway toward achieving VO2stoichiometry for amorphous vanadium oxide with magnetron sputtering eng
dc.type Article
dc.type Text
dc.relation.essn 2158-3226
dc.relation.doi https://doi.org/10.1063/5.0041116
dc.bibliographicCitation.issue 3
dc.bibliographicCitation.volume 11
dc.bibliographicCitation.firstPage 035126
dc.description.version publishedVersion eng
tib.accessRights frei zug�nglich
dc.bibliographicCitation.articleNumber 035126


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