Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots

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dc.identifier.uri http://dx.doi.org/10.15488/2831
dc.identifier.uri http://www.repo.uni-hannover.de/handle/123456789/2857
dc.contributor.author Rogge, M.C.
dc.contributor.author Fühner, C.
dc.contributor.author Keyser, U.F.
dc.contributor.author Haug, Rolf J.
dc.contributor.author Bichler, M.
dc.contributor.author Abstreiter, G.
dc.contributor.author Wegscheider, W.
dc.date.accessioned 2018-02-23T10:08:38Z
dc.date.available 2018-02-23T10:08:38Z
dc.date.issued 2003
dc.identifier.citation Rogge, M.C.; Fühner, C.; Keyser, U.F.; Haug, R.J.; Bichler, M. et al.: Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots. In: Applied Physics Letters 83 (2003), Nr. 6, S. 1163-1165. DOI: https://doi.org/10.1063/1.1599972
dc.description.abstract A study was performed on combined electron-beam lithography and atomic force microscopy used for the fabrication of variable-coupling quantum dots. The conventional electron-beam lithography was combined with direct nanofabrication by local anodic oxidation to produce a parallel double quantum dot based on a GaAs/AlGaAs heterostructure. It was found that the combination of both nanolithography methods allowed fabrication of robust in-plane gates. eng
dc.language.iso eng
dc.publisher College Park, MD : American Institute of Physics
dc.relation.ispartofseries Applied Physics Letters 83 (2003), Nr. 6
dc.rights Es gilt deutsches Urheberrecht. Das Dokument darf zum eigenen Gebrauch kostenfrei genutzt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden.
dc.subject Anodic oxidation eng
dc.subject Atomic force microscopy eng
dc.subject Electron beam lithography eng
dc.subject Heterojunctions eng
dc.subject Nanotechnology eng
dc.subject Interdot coupling eng
dc.subject Semiconductor quantum dots eng
dc.subject.ddc 530 | Physik ger
dc.title Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots eng
dc.type Article
dc.type Text
dc.relation.issn 00036951
dc.relation.doi https://doi.org/10.1063/1.1599972
dc.bibliographicCitation.issue 6
dc.bibliographicCitation.volume 83
dc.bibliographicCitation.firstPage 1163
dc.bibliographicCitation.lastPage 1165
dc.description.version publishedVersion
tib.accessRights frei zug�nglich


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