Zusammenfassung: | |
Simulation and modeling find more and more their way into thin film technology. Beside theoretical models for layer design, pre-production design analysis, and real time process control, atomistic simulation techniques gain of importance. Here, especially classical procedures such as Direct Simulation and Particle-in-Cell Monte Carlo (DSMC/PIC-MC), kinetic Monte Carlo (kMC) and Molecular Dynamics (MD) as well as quantum mechanical techniques based on Density Functional Theory (DFT) have to be mentioned. These methods are applied in order to investigate the material transport inside the coating facilities, the thin film growth in dependence of characteristic process conditions, and the optical and electronic thin film properties. By combination of these atomistic techniques in a suitable manner, a multiple scale simulation model can be realized for investigating the influence of specific process conditions on the resulting layer properties. The further extension of this virtual coater concept with respect to rate equation models enables the possibility to investigate also the interaction of laser irradiation with the modeled thin film structures. © 2015 SPIE.
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Lizenzbestimmungen: | Es gilt deutsches Urheberrecht. Das Dokument darf zum eigenen Gebrauch kostenfrei genutzt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden. Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich. |
Publikationstyp: | BookPart |
Publikationsstatus: | publishedVersion |
Erstveröffentlichung: | 2015 |
Schlagwörter (englisch): | Density Functional Theory, Direct Simulation Monte Carlo, Modeling, Molecular Dynamics, Multiple scale model, Optical properties, Particle-in-Cell Monte Carlo, Thin films, Density functional theory, Design, Design for testability, Film growth, Models, Molecular dynamics, Monte Carlo methods, Optical properties, Optical systems, Quantum theory, Systems analysis, Thin films, Atomistic simulations, Direct simulation Monte Carlo, Multiple scale models, Particle in cell, Rate-equation models, Real-time process control, Simulation and modeling, Thin-film technology, Optical films |
Fachliche Zuordnung (DDC): | 530 | Physik |
Kontrollierte Schlagwörter: | Konferenzschrift |
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